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Structure of AlN films deposited by magnetron sputtering method Cover

Structure of AlN films deposited by magnetron sputtering method

Materials Science-Poland
Volume 33 (2015): Issue 3 (September 2015)
By: K. Nowakowska-Langier,  R. Chodun,  K. Zdunek,  R. Minikayev and  R. Nietubyc  
Open Access
|Aug 2016

Authors

K. Nowakowska-Langier

k.nowakowska-langier@ncbj.gov.pl

R. Chodun

K. Zdunek

R. Minikayev

R. Nietubyc

DOI: https://doi.org/10.1515/msp-2015-0073 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
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Language: English
Page range: 639 - 643
Submitted on: Jan 15, 2015
|
Accepted on: Apr 25, 2015
|
Published on: Aug 30, 2016
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
AlN films,
magnetron sputtering method,
crystalline structure
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2016 K. Nowakowska-Langier, R. Chodun, K. Zdunek, R. Minikayev, R. Nietubyc, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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