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Morphological features in aluminum nitride epilayers prepared by magnetron sputtering Cover

Morphological features in aluminum nitride epilayers prepared by magnetron sputtering

Open Access
|Mar 2015

References

  1. [1] VASHISHTA P., KALIA R.K., NAKANO A., RINO J.P., J. Appl. Phys., 109 (2011), 033514:1-8.
  2. [2] LITIMEIN F., BOUHAFS B., DRIDI Z., RUTERANA P., New J. Phys., 4 (2002), 64.1.
  3. [3] NORTHRUP J.E., DI FELICE R., NEUGEBAUER J., Phys. Rev. B, 55 (20) (1997), 13878.
  4. [4] KAR J.P., BOSE G., Aluminum Nitride (AlN) film based acoustic devices: material synthesis and device fabrication, in M.G. BEGHI (Ed.), Acoustic Waves - From Microdevices to Helioseismology, InTech, 2011, p. 563.
  5. [5] GUDA A.A., MAZALOVA V.L., YALOVEGA G.E., SOLDATOV A.V., J. Surf. Invest.-X-Ray+, 3 (3) (2009), 460.
  6. [6] AHMAD M.A., PLANA R., IEEE Microw.Wirel. Co., 19 (3) (2009), 140.
  7. [7] AUGER M.A., VAZQUEZ L., JERGEL M., SANCHEZ O., ALBELLA J.M., Surf. Coat. Tech., 180 - 181 (2004), 140.
  8. [8] http://www.dupont.com/products-and-services/electronic-electrical-materials/uses-and-applications/microcircuit-materials.html.
  9. [9] XIONG C., PERNICE W.H.P., SUN X., SCHUCK C., FONG K.Y., TANG H.X., New J. Phys., 14 (095014) (2012), 1.
  10. [10] http://www.coorstek.com/resource-library/library/8510-1843-Aluminum_Nitride_Substrates.pdf.
  11. [11] LA SPINA L., NANVER L.K., SCHELLEVIS H., IBORRA E., CLEMENT M., OLIVARES J., ESSDERC, (2007), 354.
  12. [12] YOSHIDA M., OKUMIYA M., ICHIKI R., TEKMEN C., KHALIFA W., TSUNEKAWA Y., HARA T., J. Plasma Fusion. Res., 8 (2009), 1447.
  13. [13] GARCIA-MENDEZ M., MORALES-RODRIGUES S., MACHORRO R., DE LA CRUZ W., Rev. Mex. Fis, 54 (4) (2008), 271.
  14. [14] STAFINIAK A., MUSZYŃ SKA D., SZYSZKA A., PASZKIEWICZ B., PTASI´N SKI K., PATELA S., PASZKIEWICZ R., TŁACZAŁA M., Opt. Appl., 39 (4) (2009), 717.
  15. [15] KARMANN S., SCHENK H.P.D., KAISER U., FISSEL A., RICHTER W.O., Mater. Sci. Eng. B-Adv., 50 (1997), 228.
  16. [16] JAGANNADHAM K., SHARMA A.K., WEI Q., KALYANRAMAN R., NARAYAN J., J. Vac. Sci. Technol. A, 16 (5) (1998), 2804.
  17. [17] JONES D.J., FRENCH R.H., MULLEJANS H., LOUGHIN S., DORNEICH A.D., CARCIA P.F., J. Mater. Res., 14 (11) (1999), 4337.
  18. [18] ISHIKAWA R., LUPINI A.R., OBA F., FINDLAY S.D., SHIBATA N., TANIGUCHI T., WATANABE K., HAYASHI H., SAKAI T., TANAKA I., IKUHARA Y., PENNYCOOK S.J., Sci. Rep.-UK, 4 (2014), 3778.
  19. [19] AUGER M.A., VÁZQUEZ L., SÁNCHEZ O., JERGEL M., CUERNO R., CASTRO M., J. Appl. Phys., 97 (12) (2005), 123528.
  20. [20] MAGNUSON M., MATTESINI M., HÖGLUND C., BIRCH J., HULTMAN L., Phys. Rev. B, 80 (155105) (2009), 1.
  21. [21] EOM D., NO S.Y., HWANG C.S., KIM H.J., J. Electrochem. Soc., 153 (4) (2006), C229.
  22. [22] WALTER S., HERZOG T., HEUER H., BARTZSCH H., GLOESS D., Smart ultrasonic sensors systems: Investigations on aluminum nitride thin films for the excitation of high frequency ultrasound, 18th World Conference on Nondestructive Testing, 16 - 20 April 2012, Durban, South Africa, pp.1-7.
  23. [23] SARAVANAN S., KEIM E.G., KRIJNEN G.J.M., ELWENSPOEK M., Microscopy of Semiconducting Materials, Springer Proceedings in Physics, 107 (2005), 75.
  24. [24] ROSENBERGER L., BAIRD R., MCCULLEN E., AUNER G., SHREVE G., Surf. Interface. Anal., 40 (9) (2008), 1254.
  25. [25] GUERRERO R.M., GARCÍA J.R.V., Superficies y Vacio, 9 (1999), 82.
  26. [26] CHOUDHARY R.K., MISHRA P., BISWAS A., BIDAYE A.C., ISRN Mater. Sci., 2013 (2013), 759462.
  27. [27] http://ia.physik.rwth-aachen.de/research/sputtering/www-sputter-eng.pdf.
  28. [28] LUNDIN D., SARAKINOS K., J. Mater. Res., 27 (5) (2012), 780.
  29. [29] SHON C.H., LEE J.K., Appl. Surf. Sci., 192 (1 - 4) (2002), 258.
  30. [30] KELLY P.J., ARNELL R.D., Vacuum, 56 (2000), 159.
  31. [31] http://www.nano.iisc.ernet.in/RF%20sputtering%20manual_2010.pdf.
  32. [32] SUDHIR G.S., FUJII H., WONG W.S., KISIELOWSKI C., NEWMAN N., DIEKER C., LILIENTAL-WEBER Z., RUBIN M.D., WEBER E.R., J. Electron. Mater., 27 (4) (1998), 215.
  33. [33] NISHIMURA M., ISHIGURO T., Mater. Trans., 44 (11) (2003), 2417.
  34. [34] MISHIN S., MARX D.R., SYLVIA B., LUGHI V., TURNER K.L., CLARKE D.R., IEEE Int. Ultrason. Symposium, 2 (2003), 2028.
  35. [35] YOSHIDA M., OKUMIYA M., ICHIKI R., KHALIFA W., TEKMEN C., TSUNEKAWA Y., HARA T., TANAKA K., Plasma Process Polym., 6 (2009), S310-S313.
  36. [36] DALLAEVA D.S., BILALOV B.A., GITIKCHIEV M.A., KARDASHOVA G.D., SAFARALIEV G.K., TOMÁNEK P., ŠKARVADA P., SMITH S., Thin Solid Films, 526 (2012), 92.
  37. [37] HASS G., THUN R.F., Physics of thin films, Academic Press: New York, London, 1964, p. 396.
  38. [38] http://www.ntmdt.ie/data/media/files/accessories/afm_probes_accessories_catalogue.pdf.
  39. [39] BHUSHAN B., Introduction to Tribology, 2nd Ed., John Wiley & Sons Ltd., New York, 2013.
  40. [40] ŢĂLU Ş., Ph.D. Thesis: Researches concerning the cold rolling process of external cylindrical threads, The Technical University of Cluj-Napoca, Faculty of Machine Building, Romania, 1998.
  41. [41] CÎRSTOIU C.A., The Romanian Review Precision Mechanics, Optics & Mechatronics, 38 (2010), 163.
  42. [42] RAOUFI D., HOSSEINPANAHI F., J. Mod. Phys., 3 (8) (2012), 645.
  43. [43] ŢĂLU Ş., GHAZAI A.J., STACH S., HASSAN A., HASSAN Z., ŢĂLU M., J. Mater. Sci.-Mater. El., 25 (1) (2014), 466.
  44. [44] ŢĂLU Ş., MARKOVI´C Z., STACH S., MARKOVIĆ B.T., ¸T˘A LU M., Appl. Surf. Sci., 289 (2014), 97.
  45. [45] ŢĂLU Ş., STACH S., MÉNDEZ A., TREJO G., ŢĂLU M., J. Electrochem. Soc., 161 (2014), D44.
  46. [46] ŢĂLU Ş., STACH S., MAHAJAN A., PATHAK D., WAGNER T., KUMAR A., BEDI R.K., ¸ŢĂLU M., Electron. Mater. Lett., 10 (4) (2014), 719.
  47. [47] ŢĂLU Ş., STACH S., MAHAJAN A., PATHAK D., WAGNER T., KUMAR A., BEDI R.K., Surf. Interface. Anal., 46 (6) (2014), 393.
  48. [48] http://www.iso.org/iso/catalogue_detail.htm?csnumber=42785.
  49. [49] http://www.digitalsurf.fr/en/mntspm.html.
  50. [50] http://www.graphpad.com/scientific-software/instat/.
  51. [51] RUSS C.J., The image processing handbook, 4th Ed. CRC Press, Raleigh, North Carolina, 2002, p. 258.
DOI: https://doi.org/10.1515/msp-2015-0036 | Journal eISSN: 2083-134X (formerly 2083-124X) | Journal ISSN: 2083-1331
Language: English
Page range: 175 - 184
Submitted on: Sep 2, 2014
Accepted on: Dec 1, 2014
Published on: Mar 13, 2015
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services

© 2015 Sebastian Stach, Dinara Dallaeva, Ştefan Ţălu, Pavel Kaspar, Pavel Tománek, Stefano Giovanzana, Lubomír Grmela, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.