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Optical properties of the plasma hydrogenated ZnO thin films Cover

Optical properties of the plasma hydrogenated ZnO thin films

Journal of Electrical Engineering
Volume 68 (2017): Issue 7 (December 2017)
By: Yu-Ying Chang,  Jiří Stuchlík,  Neda Neykova,  Josef Souček and  Zdeněk Remeš  
Open Access
|Dec 2017

Authors

Yu-Ying Chang

chang@fzu.cz

Institute of Physics CAS, Prague
Faculty of Biomedical Engineering CTU in Prague, Kladno

Jiří Stuchlík

Institute of Physics CAS, Prague

Neda Neykova

Institute of Physics CAS, Prague

Josef Souček

Faculty of Biomedical Engineering CTU in Prague, Kladno

Zdeněk Remeš

Institute of Physics CAS, Prague
Faculty of Biomedical Engineering CTU in Prague, Kladno
DOI: https://doi.org/10.1515/jee-2017-0060 | Journal eISSN: 1339-309X | Journal ISSN: 1335-3632
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Language: English
Page range: 70 - 73
Submitted on: Apr 23, 2017
|
Published on: Dec 29, 2017
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Publication frequency: 6 issues per year
Keywords:
metal oxide,
magnetron sputtering,
thin films,
reflectance interferometry,
photothermal deflection spectroscopy
Related subjects:
Engineering,
Introductions and overviews,
Engineering, other

© 2017 Yu-Ying Chang, Jiří Stuchlík, Neda Neykova, Josef Souček, Zdeněk Remeš, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

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