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Positron and nanoindentation study of helium implanted high chromium ODS steels Cover

Positron and nanoindentation study of helium implanted high chromium ODS steels

Journal of Electrical Engineering
Volume 68 (2017): Issue 7 (December 2017)
By: Jana Simeg Veternikova,  Martin Fides,  Jarmila Degmova,  Stanislav Sojak,  Martin Petriska and  Vladimir Slugen  
Open Access
|Dec 2017

Authors

Jana Simeg Veternikova

jana.veternikova@stuba.sk

Institute of Nuclear and Physical Engineering, Faculty of Electrical and Information Technology, Slovak University of Technology, Bratislava, Slovakia

Martin Fides

Institute of Materials Research, Slovak Academy of Sciences, Košice, Slovakia

Jarmila Degmova

Institute of Nuclear and Physical Engineering, Faculty of Electrical and Information Technology, Slovak University of Technology, Bratislava, Slovakia

Stanislav Sojak

Institute of Nuclear and Physical Engineering, Faculty of Electrical and Information Technology, Slovak University of Technology, Bratislava, Slovakia

Martin Petriska

Institute of Nuclear and Physical Engineering, Faculty of Electrical and Information Technology, Slovak University of Technology, Bratislava, Slovakia

Vladimir Slugen

Institute of Nuclear and Physical Engineering, Faculty of Electrical and Information Technology, Slovak University of Technology, Bratislava, Slovakia
DOI: https://doi.org/10.1515/jee-2017-0058 | Journal eISSN: 1339-309X | Journal ISSN: 1335-3632
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Language: English
Page range: 62 - 65
Submitted on: Apr 23, 2017
|
Published on: Dec 29, 2017
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Publication frequency: 6 issues per year
Keywords:
ODS steels,
helium ion implantation,
nanoindentation,
vacancy defects
Related subjects:
Engineering,
Introductions and overviews,
Engineering, other

© 2017 Jana Simeg Veternikova, Martin Fides, Jarmila Degmova, Stanislav Sojak, Martin Petriska, Vladimir Slugen, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

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