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Effects of HSQ e–beam Resist Processing on the Fabrication of ICP–RIE Etched TiO2 Nanostructures Cover

Effects of HSQ e–beam Resist Processing on the Fabrication of ICP–RIE Etched TiO2 Nanostructures

Open Access
|Dec 2016

References

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DOI: https://doi.org/10.1515/jee-2016-0067 | Journal eISSN: 1339-309X | Journal ISSN: 1335-3632
Language: English
Page range: 454 - 458
Submitted on: Jul 7, 2016
Published on: Dec 30, 2016
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Publication frequency: 6 issues per year

© 2016 Ivan Hotovy, Ivan Kostic, Martin Predanocy, Pavol Nemec, Vlastimil Rehacek, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.