Effects of HSQ e–beam Resist Processing on the Fabrication of ICP–RIE Etched TiO2 Nanostructures
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Language: English
Page range: 454 - 458
Submitted on: Jul 7, 2016
Published on: Dec 30, 2016
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Publication frequency: 6 issues per year
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© 2016 Ivan Hotovy, Ivan Kostic, Martin Predanocy, Pavol Nemec, Vlastimil Rehacek, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.