Effects of HSQ e–beam Resist Processing on the Fabrication of ICP–RIE Etched TiO2 Nanostructures
Authors
Ivan Kostic
Slovakia
Martin Predanocy
Slovakia
Pavol Nemec
Slovakia
Vlastimil Rehacek
Slovakia
DOI: https://doi.org/10.1515/jee-2016-0067 | Journal eISSN: 1339-309X (formerly 1335-3632) | Journal ISSN: 1335-3632
Language: English
Page range: 454 - 458
Submitted on: Jul 7, 2016
Published on: Dec 30, 2016
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Keywords:
Related subjects:
© 2016 Ivan Hotovy, Ivan Kostic, Martin Predanocy, Pavol Nemec, Vlastimil Rehacek, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.