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Effects of HSQ e–beam Resist Processing on the Fabrication of ICP–RIE Etched TiO2 Nanostructures Cover

Effects of HSQ e–beam Resist Processing on the Fabrication of ICP–RIE Etched TiO2 Nanostructures

Journal of Electrical Engineering
Volume 67 (2016): Issue 6 (December 2016)
By: Ivan Hotovy,  Ivan Kostic,  Martin Predanocy,  Pavol Nemec and  Vlastimil Rehacek  
Open Access
|Dec 2016

Authors

Ivan Hotovy

ivan.hotovy@stuba.sk

Ivan Kostic

Martin Predanocy

Pavol Nemec

Vlastimil Rehacek

DOI: https://doi.org/10.1515/jee-2016-0067 | Journal eISSN: 1339-309X | Journal ISSN: 1335-3632
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Language: English
Page range: 454 - 458
Submitted on: Jul 7, 2016
Published on: Dec 30, 2016
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Publication frequency: 6 issues per year
Keywords:
HSQ e-beam resist,
ICP-RIE etching,
TiO dots array
Related subjects:
Engineering,
Introductions and overviews,
Engineering, other

© 2016 Ivan Hotovy, Ivan Kostic, Martin Predanocy, Pavol Nemec, Vlastimil Rehacek, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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