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Macroscopic Thin Film Deposition Model for the Two-Reactive-Gas Sputtering Process Cover

Macroscopic Thin Film Deposition Model for the Two-Reactive-Gas Sputtering Process

Acta Universitatis Sapientiae, Electrical and Mechanical Engineering
Volume 8 (2016): Issue 1 (December 2016)
By: András Kelemen,  Domokos Biró,  Albert-Zsombor Fekete,  László Jakab-Farkas and  Róbert Rossi Madarász  
Open Access
|Sep 2017
DOI: https://doi.org/10.1515/auseme-2017-0005 | Journal eISSN: 2066-8910
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Language: English
Page range: 62 - 78
Submitted on: Feb 15, 2017
|
Published on: Sep 9, 2017
Published by: Sapientia Hungarian University of Transylvania
In partnership with: Paradigm Publishing Services
Publication frequency: 1 issue per year
Keywords:
DC magnetron sputtering,
thin film deposition,
reactive sputtering,
macroscopic modelling
Related subjects:
Engineering,
Electrical engineering,
Information technology,
Energy engineering,
Mechanical engineering,
Tools and methods,
Process engineering and industrial engineering

© 2017 András Kelemen, Domokos Biró, Albert-Zsombor Fekete, László Jakab-Farkas, Róbert Rossi Madarász, published by Sapientia Hungarian University of Transylvania
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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