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Macroscopic Thin Film Deposition Model for the Two-Reactive-Gas Sputtering Process Cover

Macroscopic Thin Film Deposition Model for the Two-Reactive-Gas Sputtering Process

Acta Universitatis Sapientiae, Electrical and Mechanical Engineering
Volume 8 (2016): Issue 1 (December 2016)
By: András Kelemen,  Domokos Biró,  Albert-Zsombor Fekete,  László Jakab-Farkas and  Róbert Rossi Madarász  
Open Access
|Sep 2017

Authors

András Kelemen

kandras@ms.sapientia.ro

Department of Electrical Engineering, Faculty of Technical and Human Sciences, Sapientia Hungarian University of Transylvania, Tg. Mureş

Domokos Biró

dbiro@ms.sapientia.ro

Department of Mechanical Engineering, Faculty of Technical and Human Sciences, Sapientia Hungarian University of Transylvania, Tg. Mureş

Albert-Zsombor Fekete

Department of Electrical Engineering, Faculty of Technical and Human Sciences, Sapientia Hungarian University of Transylvania, Tg. Mureş

László Jakab-Farkas

Department of Electrical Engineering, Faculty of Technical and Human Sciences, Sapientia Hungarian University of Transylvania, Tg. Mureş

Róbert Rossi Madarász

Department of Electrical Engineering, Faculty of Technical and Human Sciences, Sapientia Hungarian University of Transylvania, Tg. Mureş
DOI: https://doi.org/10.1515/auseme-2017-0005 | Journal eISSN: 2066-8910
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Language: English
Page range: 62 - 78
Submitted on: Feb 15, 2017
|
Published on: Sep 9, 2017
Published by: Sapientia Hungarian University of Transylvania
In partnership with: Paradigm Publishing Services
Publication frequency: 1 issue per year
Keywords:
DC magnetron sputtering,
thin film deposition,
reactive sputtering,
macroscopic modelling
Related subjects:
Engineering,
Electrical engineering,
Information technology,
Energy engineering,
Mechanical engineering,
Tools and methods,
Process engineering and industrial engineering

© 2017 András Kelemen, Domokos Biró, Albert-Zsombor Fekete, László Jakab-Farkas, Róbert Rossi Madarász, published by Sapientia Hungarian University of Transylvania
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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