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Effect of substrate temperature on the electrical and optical properties of electron beam evaporated indium antimonide thin films Cover

Effect of substrate temperature on the electrical and optical properties of electron beam evaporated indium antimonide thin films

By: Rahul,  A. Verma,  R. Tripathi and  S. Vishwakarma  
Open Access
|Dec 2012

References

  1. [1] Mangal R.K., Vijay Y.K., Bull. Mater. Sci., 30 (2007) 117. http://dx.doi.org/10.1007/s12034-007-0021-x10.1007/s12034-007-0021-x
  2. [2] Mangal R.K., Triapthi B., Singh M., Vijay Y.K., Rais A., Indian J. Pure & Applied Phys., 45 (2007) 987.
  3. [3] Mangal R.K., Vijay Y.K., Avatshi D.K., Shekher B.R., Indian J. Engineering & Materials Science, 14 (2007) 253.
  4. [4] Heremans J., Partin D.L., Thrush C.M., Semi Sci. Technol., 8 (1993) 424. http://dx.doi.org/10.1088/0268-1242/8/1S/09310.1088/0268-1242/8/1S/093
  5. [5] Carpenter M.K., Verbrugge M.W., J. Mater. Res., 9 (1994) 2584. http://dx.doi.org/10.1557/JMR.1994.258410.1557/JMR.1994.2584
  6. [6] Okamoto A., Yoshida T., Muramatsu S., Shibasaki I., J. Cryst. Growth, 201 (1999) 765. http://dx.doi.org/10.1016/S0022-0248(98)01466-310.1016/S0022-0248(98)01466-3
  7. [7] Udayshnakar N.K., Bhat H.L., Bull. Mater. Sci., 24, (2001) 445. http://dx.doi.org/10.1007/BF0270671410.1007/BF02706714
  8. [8] Zhang T., Clowes S.K., Debnath M., Bennett A., Roberts C., Harries J.J., Stradling R.A., Appl. Phys. Lett., 84, (2004) 22. http://dx.doi.org/10.1063/1.163743110.1063/1.1637431
  9. [9] Gaskill D.K., Stauf G.T., Bottka N., Appl. Phys. Lett., 58 (1991) 1905. http://dx.doi.org/10.1063/1.10506910.1063/1.105069
  10. [10] Taher A., Daffodil International University Journal of Science & Technology, 2 (2007), 39.
  11. [11] Holunes D.E., Kamnath G.S., J. Electron Mater., 9 (1980), 95. http://dx.doi.org/10.1007/BF0265521710.1007/BF02655217
  12. [12] Miyazaaki T., Kunugi M., Kitamure Y., Adachi S., Thin Solid Films, 287 (1996), 51. http://dx.doi.org/10.1016/S0040-6090(96)08738-X10.1016/S0040-6090(96)08738-X
  13. [13] Vishwakarma S.R., Verma A.K., Tripathi R.S.N., Das S., Rahul, Indian J. Pure & Applied Phys., 50 (2012), 346.
  14. [14] Vishwakarma S.R., Verma A.K., Tripathi R.S.N., Rahul, Proc. Natl. Acad. Sci., India, Sect. A Phys. Sci., 82 (2012), 245, DOI: 10.1007/s40010-012-0031-y. http://dx.doi.org/10.1007/s40010-012-0031-y10.1007/s40010-012-0031-y
  15. [15] Rahul, Verma A.K., Tripathi R.S.N., Vishwakarma S.R., Natl. Acad. Sci. Lett., DOI 10.1007/s40009-012-0060-8 (2012).
  16. [16] Tyagi M.S., Introduction to Semiconductor Materials & Devices, John Wiley & Sons, Inc (1991) 614.
  17. [17] Meehta C., Abass J., Saini G., Tripathi S., Chalcogenide Letter, 11 (2007), 133.
  18. [18] Singh M., Vijay Y.K., Indian Journal of Pure & Applied Physics, 42 (2004), 610.
  19. [19] Sze S.M., Physics of Semiconductor Devices, Ed.2, New Delhi, H.S. Poplai, Wiley Eastern Ltd, (1993) 31.
  20. [20] Okamoto A., Shibasaki I., Journal of Crystal Growth, 251 (2003), 560. http://dx.doi.org/10.1016/S0022-0248(02)02448-X10.1016/S0022-0248(02)02448-X
  21. [21] Senthilkumar V., Venkatachalam S., Viswanath C., Wilson K.C., Vijay Kumar K.P., Cryst. Res. Technol., 40,6 (2005), 573. http://dx.doi.org/10.1002/crat.20041038510.1002/crat.200410385
  22. [22] Okamoto A., Ashihara A., Akaogi T., Shibasaki I., Journal of Crystal Growth, 227 (2001), 619. http://dx.doi.org/10.1016/S0022-0248(01)00784-910.1016/S0022-0248(01)00784-9
  23. [23] Ani S.K.J., Obaid Y.N., Kasim S.J., Mahdi M.A., Int. J. Nanoelectronics & Materials, 2 (2009), 109.
  24. [24] Singh S., Lal K., Srivastava A., Sood K., Kishore R., Indian Journal of Engineering & Material Sciences, 14 (2007), 55.
DOI: https://doi.org/10.2478/s13536-012-0044-x | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
Language: English
Page range: 375 - 381
Published on: Dec 14, 2012
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year

© 2012 Rahul, A. Verma, R. Tripathi, S. Vishwakarma, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.