
Fig. 1.
(A) The schematic diagram of the GLAD technique, and (B) diagram of the self-shadowing effect during the growth of the layer. GLAD, glancing angle deposition

Fig. 2.
(A) XRD patterns of AgxO thin films deposited, respectively, at γ=0°, 20°, 40°, 60°, 75°, and 85°annealed at 300°C, and (B) XRD patterns of AgxO thin films in the Bragg angles range 35°–40°. XRD, X-ray diffraction

Fig. 3.
(A) XRD patterns of AgxO thin films deposited, respectively, at γ=0°, 20°, 40°, 60°, 75°, and 85°annealed at 400°C, and (B) XRD patterns of AgxO thin films in the Bragg angles range 35°–40°. XRD, X-ray diffraction
Table 1.
Different phases, Bragg angles, and reticular planes (hkl) of the samples for the incident angles γ=0°, 20°, 40°, 60°, 75°, and 85°and the incident angles γ=0°, 20°, 40°, and 60° for the annealing temperatures 300°C and 400°C, respectively
| Annealing temperature (°C) | Deposition angle γ (°) | Bragg angle 2θ(°) | Phases | (hkl) |
|---|---|---|---|---|
| 300 | 00 | 38.1 | Ag | (111) |
| 20 | 44.3 | Ag | (200) | |
| 40 | 38.1 | Ag | (111) | |
| 60 | 38.2 | Ag2O | (200) | |
| 75 | 44.3 | Ag | (200) | |
| 85 | 32.2 | Ag2O | (111) | |
| 38.1 | Ag | (111) | ||
| 38.2 | Ag2O | (200) | ||
| 44.3 | Ag | (200) | ||
| 32.2 | Ag2O | (111) | ||
| 38.1 | Ag | (111) | ||
| 38.2 | Ag2O | (200) | ||
| 44.3 | Ag | (200) | ||
| 32.2 | Ag2O | (111) | ||
| 38.2 | Ag2O | (200) | ||
| 44.4 | Ag | (200) | ||
| 32.2 | Ag2O | (111) | ||
| 38.2 | Ag2O | (200) | ||
| 400 | 00 | 38.1 | Ag | (111) |
| 20 | 44.4 | Ag | (200) | |
| 40 | 38.1 | Ag | (111) | |
| 60 | 38.2 | Ag2O | (200) | |
| 44.3 | Ag | (200) | ||
| 38.1 | Ag | (111) | ||
| 38.2 | Ag2O | (200) | ||
| 44.3 | Ag | (200) | ||
| 38.1 | Ag | (111) | ||
| 38.2 | Ag2O | (200) | ||
| 44.3 | Ag | (200) |
Table 2.
Structural data of nanocolumnar silver oxide thin films for the incident angles γ=0°, 20°, 40°, 60°, 75°, and 85°, and with the annealing temperature at 300°C and 400°C
| Annealing temperature (°C) | Deposition angleγ(°) | Crystallite size (nm) | Strain ε (×10−3) | Dislocation density (δ)(×10−3) (nm−2) |
|---|---|---|---|---|
| 300 | 00 | 36 | 2.95 | 0.77 |
| 20 | 55 | 1.92 | 0.33 | |
| 40 | 51 | 2.09 | 0.38 | |
| 60 | 54 | 1.95 | 0.34 | |
| 75 | 26 | 3.97 | 1.47 | |
| 85 | 27 | 3.90 | 1.37 | |
| 400 | 00 | 37 | 2.81 | 0.73 |
| 20 | 57 | 1.96 | 0.30 | |
| 40 | 51 | 2.09 | 0.38 | |
| 60 | 55 | 1.97 | 0.32 | |
| 75 | – | – | – | |
| 85 | – | – | – |

Fig. 4.
Surface morphology of silver thin film before annealing for the incident angle γ=0°

Fig. 5.
Surface morphologies of silver oxide thin films after annealing at 300°C for the incident angles a=(γ=0°), b= (γ=40°), c=(γ=60°), d=(γ=75°), and e=(γ=85°)

Fig. 6.
Surface morphologies of silver oxide thin films after annealing at 400°C for the incident angles a=(γ=0°), b= (γ=40°), c=(γ=60°), d=(γ=75°), and e=(γ=85°)

Fig. 7.
Cross-section of AgxO thin films deposited at incident angles(A)γ= 60°, (B)γ=75°, and (C)γ=85°

Fig. 8.
(A) Transmittance spectra and (B) reflectance spectra of AgxO films deposited, respectively, at γ=0°, 20°, 40°, 60°, 75°, and 85° for the annealing temperature in free air of 300°C, for silver thin films

Fig. 9.
(A) Transmittance spectra and (B) reflectance spectra of AgxO films deposited, respectively, at γ=0°, 20°, 40°, 60°, 75°, and 85° for the annealing temperature in free air of 400°C, for silver thin films

Fig. 10.
Plot of average reflection for AgxO thin films deposited at different deposition angles (γ=0°, 20°, 40°, 60°, 75°, and 85°) annealed at 300°C and 400°C

Fig. 11.
The variation of the thickness for the incident angles γ= 40°, 60°, 75°, and 85°for the annealing temperatures (A) 300°C and (B) 400°C

Fig. 12.
Extinction coefficient spectra of films deposited at incident angles γ=40°, 60°, 75°, and 85°annealed in free air at (A) 300°C and (B) 400°C

Fig. 13.
Refractive index spectra of films deposited at incident angles γ=40°, 60°, 75°, and 85°annealed in free air at (A) 300°C and (B) 400°C

Fig. 14.
Δn spectra of films deposited at incident angles γ=40, 60°, 75°, and 85°annealed in free air at (A) 300°C and (B) 400°C

Fig. 15.
The variation of the plane birefringence Δn for AgxO thin films deposited at different deposition angles (γ=0°, 20°, 40°, 60°, 75°, and 85°) for the annealing temperature in free air 300°C, for silver thin films

Fig. 16.
Absorption coefficient spectra of films deposited at incident angles γ=40°, 60°, 75°, and 85°annealed in free air at (A) 300°C and (B) 400°C

Fig. 17.
Direct band gap energy spectra of films deposited at incident angles γ=40°, 60°, 75°, and 85°annealed in free air at (A) 300°C and (B) 400°C