Response of alumina resistance to trace concentrations of acetone vapors at room temperature

Ivančo, Ján; Halahovets, Yuriy; Benkovičová, Monika; Mičušík, Matej; Kollár, Jozef; Kostiuk, Dmytro; Hološ, Ana; Mosnáček, Jaroslav

doi:10.2478/jee-2019-0053

Abstract

The study demonstrates that resistivity of an alumina wafer is highly sensitive to trace concentrations of acetone vapors at room temperature. Though, a thermal pretreatment is necessary to precede the room-temperature sensing of acetone vapors, whilst the sensitiveness increases with the pretreatment temperature. This advocates the alumina being suitable for an adequate acetone sensor in the ppm range. A plausible mechanism of the response is discussed.

References

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Response of alumina resistance to trace concentrations of acetone vapors at room temperature

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