The influence of substrate bias voltage on the electrochemical properties of ZrN thin films deposited by radio-frequency magnetron sputtering: Biomedical application Cover

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The influence of substrate bias voltage on the electrochemical properties of ZrN thin films deposited by radio-frequency magnetron sputtering: Biomedical application

Journal of Electrical Engineering

Volume 70 (2019): Issue 7 (December 2019)

By: Mourad Azibi, Nadia Saoula and Hamid Aknouche

Open Access

|Sep 2019

Authors

Mourad Azibi

Centre de Développement des Technologies Avancées (CDTA), Alger

Unité de Recherche Matériaux Procédés et Environnement, Faculté des Sciences de lIngénieur Cité Frantz Fanon, Université MhamedBougara, Boumerdes

Nadia Saoula

nsaoula@cdta.dz

Centre de Développement des Technologies Avancées (CDTA), Alger

Hamid Aknouche

Unité de Recherche Matériaux Procédés et Environnement, Faculté des Sciences de lIngénieur Cité Frantz Fanon, Université MhamedBougara, Boumerdes

DOI: https://doi.org/10.2478/jee-2019-0051 | Journal eISSN: 1339-309X | Journal ISSN: 1335-3632

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Language: English

Page range: 112 - 116

Submitted on: Mar 19, 2019

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Published on: Sep 28, 2019

Published by: Slovak University of Technology in Bratislava

In partnership with: Paradigm Publishing Services

Publication frequency: 6 issues per year

Keywords:

316L stainless steel,

RF magnetron sputtering,

Related subjects:

Introductions and overviews,

Engineering, other

© 2019 Mourad Azibi, Nadia Saoula, Hamid Aknouche, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

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