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On KCN treatment effects on optical properties of Si-based bilayers Cover

On KCN treatment effects on optical properties of Si-based bilayers

Journal of Electrical Engineering
Volume 70 (2019): Issue 7 (December 2019)
By: Jarmila Müllerová,  Emil Pinčík,  Martin Králik,  Michaela Holá,  Masao Takahashi and  Hikaru Kobayashi  
Open Access
|Sep 2019

Authors

Jarmila Müllerová

mullerova@lm.uniza.sk

Institute of Aurel Stodola, Faculty of Electrical Engineering and Information Technology, University of Žilina, Liptovský Mikuláš, Slovakia

Emil Pinčík

Institute of Physics, Slovak Academy of Sciences, Bratislava, Slovakia

Martin Králik

Institute of Aurel Stodola, Faculty of Electrical Engineering and Information Technology, University of Žilina, Liptovský Mikuláš, Slovakia

Michaela Holá

Institute of Aurel Stodola, Faculty of Electrical Engineering and Information Technology, University of Žilina, Liptovský Mikuláš, Slovakia

Masao Takahashi

Institute of Scientific, Industrial Research of Osaka University, Osaka, Japan
Tokyo University of Technology, Tokyo, Japan

Hikaru Kobayashi

Institute of Scientific, Industrial Research of Osaka University, Osaka, Japan
DOI: https://doi.org/10.2478/jee-2019-0045 | Journal eISSN: 1339-309X | Journal ISSN: 1335-3632
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Language: English
Page range: 77 - 82
Submitted on: Mar 19, 2019
|
Published on: Sep 28, 2019
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Publication frequency: 6 issues per year
Keywords:
KCN treatment,
effective thin film,
bilayers,
silicon,
refractive index,
optical band gap
Related subjects:
Engineering,
Introductions and overviews,
Engineering, other

© 2019 Jarmila Müllerová, Emil Pinčík, Martin Králik, Michaela Holá, Masao Takahashi, Hikaru Kobayashi, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

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