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Structural details of ZnO thin film derived from XRD_
| Sl. No. | Deposition duration (min) | 2θ (Deg) | FWHM (Deg) | Average grain size (nm) |
|---|---|---|---|---|
| 1 | 15 | 33.950 | 0.796 | 10.905 |
| 2 | 30 | 33.890 | 0.684 | 12.694 |
| 3 | 45 | 33.890 | 0.601 | 14.435 |
| 4 | 60 | 34.014 | 0.517 | 16.777 |
Sputtering parameters used for deposition of ZnO thin film_
| Target – substrate distance | 28 cm |
| Substrate temperature | 24 ± 2oC |
| RF power | 120 W |
| Ar-O2 ratio | 17.1–3.1 Sccm (85%–15%) |
| Ultimate pressure | 5 × 10−6 mbar |
| Working pressure | 1.4 × 10−2 mbar |
| Deposition time | 15, 30, 45, and 60 min |