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The Impact of Phenological and Artificial Factors on Seed Quality in a Nematode-resistant Pinus densiflora Seed Orchard Cover

The Impact of Phenological and Artificial Factors on Seed Quality in a Nematode-resistant Pinus densiflora Seed Orchard

Silvae Genetica
Volume 58 (2009): Issue 1-6 (December 2009)
By: H. Ozawa,  J. Watanabe,  H. Chen,  K. Isoda and  A. Watanabe  
Open Access
|Oct 2017

Authors

H. Ozawa

Fukushima Prefectural Forestry Research Centre, 1 Nishijimasaka, Narita, Asaka-machi,, Koriyama, Japan

J. Watanabe

Fukushima Prefectural Forestry Research Centre, 1 Nishijimasaka, Narita, Asaka-machi,, Koriyama, Japan

H. Chen

Hubei Provincial Forestry Bureau, 355 Xiongchudajie, Hongshan,, Wuhan, China

K. Isoda

Forest Tree Breeding Center, Independent Administrative Institution, 3809-1 Ishi, Juo, Hitachi,, Ibaraki, Japan

A. Watanabe

nabeatsu@affrc.go.jp

Forest Tree Breeding Center, Independent Administrative Institution, 3809-1 Ishi, Juo, Hitachi,, Ibaraki, Japan
DOI: https://doi.org/10.1515/sg-2009-0019 | Journal eISSN: 2509-8934 | Journal ISSN: 0037-5349
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Language: English
Page range: 145 - 152
Submitted on: Jun 15, 2007
Published on: Oct 19, 2017
Published by: Johann Heinrich von Thünen Institute
In partnership with: Paradigm Publishing Services
Publication frequency: 1 issue per year
Keywords:
nematode resistant,
Pinus densiflora,
pollen contamination,
resistant ability,
seed orchard,
seed quality,
SSR marker.
Related subjects:
Life sciences,
Molecular biology,
Genetics,
Biotechnology,
Plant science

© 2017 H. Ozawa, J. Watanabe, H. Chen, K. Isoda, A. Watanabe, published by Johann Heinrich von Thünen Institute
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

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