Application of argon plasma sheet in the etching process of calcium carbonate crystals for AFM tests
Authors
Magdalena Moczała
Electrotechnical Institute, Division of Electrotechnology and Materials Science, M. Skłodowskiej-Curie 55/61, 50-369, Wrocław, Poland
Miriam Karpińska
Active Students Association, Association of Polish Electrical Engineers SEP (Branch No. 1 in Wrocław), M. Skłodowskiej-Curie 55/61, 50-369, Wrocław, Poland
Monika Poznar
Wrocław University of Science and Technology, Faculty of Chemistry, Department of Biochemistry, Wybrzeże Wyspiańskiego 27, 50-370, Wrocław, Poland
Piotr Dobryszycki
Wrocław University of Science and Technology, Faculty of Chemistry, Department of Biochemistry, Wybrzeże Wyspiańskiego 27, 50-370, Wrocław, Poland
Andrzej Sikora
Electrotechnical Institute, Division of Electrotechnology and Materials Science, M. Skłodowskiej-Curie 55/61, 50-369, Wrocław, Poland
Language: English
Page range: 75 - 79
Submitted on: Mar 29, 2017
Accepted on: Feb 4, 2018
Published on: May 18, 2018
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
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© 2018 Magdalena Moczała, Miriam Karpińska, Monika Poznar, Piotr Dobryszycki, Andrzej Sikora, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.