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Morphology and photoresponse of crystalline antimony film grown on mica by physical vapor deposition

Open Access
|Sep 2016

Figures & Tables

Fig. 1

Illustration of the basic nucleation modes.
Illustration of the basic nucleation modes.

Fig. 2

(a) Schematic of the physical vapor deposition reactor, (b) temperature gradient measured inside the furnace tube.
(a) Schematic of the physical vapor deposition reactor, (b) temperature gradient measured inside the furnace tube.

Fig. 3

XRD patterns of antimony coated and uncoated mica.
XRD patterns of antimony coated and uncoated mica.

Fig. 4

SEM micrographs of the antimony thin film grown on a mica sheet.
SEM micrographs of the antimony thin film grown on a mica sheet.

Fig. 5

Pre-annealing EDX and SEM of antimony film.
Pre-annealing EDX and SEM of antimony film.

Fig. 6

Post-annealing EDX and SEM of antimony film.
Post-annealing EDX and SEM of antimony film.

Fig. 7

Current density-voltage (j-V) characteristics of antimony thin film under dark and light scenarios.
Current density-voltage (j-V) characteristics of antimony thin film under dark and light scenarios.

Summary of the growth conditions and vapor concentration in furnace tube of PVD reactor (Source temperature 900 °C, growth temperature 441 °C, source before deposition: 0_1044 g, after deposition: 0_000 g)_

Time [min]1581318233346667176818691160
Temp. [°C]300450600770900900900900900900900800700600300
Pressure 0.1 Pa1.41.41.41.41.4 GFC
*

GFC: Growth Flow Condition

1.41.01.08.68.67.47.47.48.61.4
DOI: https://doi.org/10.1515/msp-2016-0084 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
Language: English
Page range: 591 - 596
Submitted on: Dec 1, 2016
Accepted on: Jul 3, 2016
Published on: Sep 12, 2016
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year

© 2016 Muhammad Shafa, Zhiming Wang, Muhammad Yasin Naz, Sadaf Akbar, Muhammad Umar Farooq, Abdul Ghaffar, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.