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Novel GIMS technique for deposition of colored Ti/TiO₂ coatings on industrial scale Cover

Novel GIMS technique for deposition of colored Ti/TiO₂ coatings on industrial scale

Materials Science-Poland
Volume 34 (2016): Issue 1 (March 2016)
By: Krzysztof Zdunek,  Lukasz Skowroński,  Rafal Chodun,  Katarzyna Nowakowska-Langier,  Andrzej Grabowski,  Wojciech Wachowiak,  Sebastian Okrasa,  Agnieszka Wachowiak,  Olaf Strauss,  Andrzej Wronkowski and  Piotr Domanowski  
Open Access
|Apr 2016

Figures & Tables

Fig. 1

Industrial facility for large area glasses covering built up and working at BOHAMET Company. The facility was used in the present work.
Industrial facility for large area glasses covering built up and working at BOHAMET Company. The facility was used in the present work.

Fig. 2

Specimens location along the magnetron cath-ode. The numbered (1-5) positions were spe-cially chosen, taking into account the essential points with respect to the gas outlets (all of the dimensions are given in mm).
Specimens location along the magnetron cath-ode. The numbered (1-5) positions were spe-cially chosen, taking into account the essential points with respect to the gas outlets (all of the dimensions are given in mm).

Fig. 3

Reflectance spectra for Ti samples (a) and trans-mittance spectra of transparent TiO₂ layers (b).
Reflectance spectra for Ti samples (a) and trans-mittance spectra of transparent TiO₂ layers (b).

Fig. 4

Reflectance spectra of the colored TiO₂/Ti/glass coatings for the thinner (a) and thicker (b) tita-nium oxide layers.
Reflectance spectra of the colored TiO₂/Ti/glass coatings for the thinner (a) and thicker (b) tita-nium oxide layers.

Thickness and resistivity of the layers positioned along the target length_

Layer type/position of specimen12345
TiThickness, nm131152150149141
Resistance, Ohm13.4811.5513.0111.5311.41
T1O₂ on glassThickness, nm18.5019.1018.1018.3018.60
26.7028.1026.5026.4026.90
51.3056.4054.0053.5053.20
TiO₂ on Ti/glassThickness, nm16.4017.0016.3016.1015.60
24.8026.0024.7024.6023.90
49.3051.8051.0049.8048.30
DOI: https://doi.org/10.1515/msp-2016-0024 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
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Language: English
Page range: 137 - 141
Submitted on: Jul 29, 2015
Accepted on: Dec 14, 2015
Published on: Apr 27, 2016
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
GIMS - Gas Injection Magnetron Sputtering,
Plasma Surface Engineering,
Impulse Plasma Deposition
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2016 Krzysztof Zdunek, Lukasz Skowroński, Rafal Chodun, Katarzyna Nowakowska-Langier, Andrzej Grabowski, Wojciech Wachowiak, Sebastian Okrasa, Agnieszka Wachowiak, Olaf Strauss, Andrzej Wronkowski, Piotr Domanowski, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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