Have a personal or library account? Click to login

Effect of Ag on Sn–Cu and Sn–Zn lead free solders

Open Access
|Jul 2015

References

  1. [1] EL-DALY A.A., HAMMAD A.E., J. Alloy. Compd., 509 (34) (2011), 8554.10.1016/j.jallcom.2011.05.119
  2. [2] WU C.M.L., HUANG M.L., J. Electron. Mater., 31 (5) (2002), 442.10.1007/s11664-002-0098-3
  3. [3] REDDY B., BHATTACHARYA P., SINGH B., CHATTOPADHAYA K., J. Mater. Sci., 44 (2009), 2257.10.1007/s10853-008-3146-4
  4. [4] EL-DALY A.A., EL-TAHER A.M., DALLOUL T.R., Mater. Design, 55 (2014), 309.10.1016/j.matdes.2013.10.009
  5. [5] ROSALBINO F., ANGELINI E., ZANICCHI G., MARAZZA R., Mater. Chem. Phys., 109 (2008), 386.10.1016/j.matchemphys.2007.12.006
  6. [6] KANG S.K., SHIH D.Y., LEONARD D., HENDERSON D.W., GOSSELIN T.C., SUNG-IL YU J., CHOI W.K., JOM, 56 (6) (2004), 34.10.1007/s11837-004-0108-4
  7. [7] EL-DALY A.A., HAMMAD A.E., Mater. Design, 40 (2012), 292.10.1016/j.matdes.2012.04.007
  8. [8] ZHANG L., BAIXUE S., GAO L., CHEN Y., YU S., SHENG Z., ZENG G., J. Mater. Sci.- Mater. El., 20 (2009), 1193.10.1007/s10854-008-9850-7
  9. [9] YU D.Q., ZHAO J., WANG L., J. Alloy. Compd., 376 (1 - 2) (2004), 170.10.1016/j.jallcom.2004.01.012
  10. [10] MUDRYI S.I., SHATBLAVYI I.I., SKLYARCHUK V.I., PLEVACHUK Y.O., KOROLYSHYN A.V., YAKYMOVYCH A.S., Mater. Sci.+, 46 (4) (2011), 464.10.1007/s11003-011-9313-9
  11. [11] BIOCCA P., Creating Solder Joint Reliability with SnCu Based Solders Some Practical Experiences, Kester, Illinois, USA, 2009.
  12. [12] MILLER C.M., ANDERSON I.E., SMITH J.F., J. Electron. Mater., 23 (7) (1994), 595.10.1007/BF02653344
  13. [13] OHNUMA I., MIYASHITA M., ANZAI K., LIU X.J., OHTANI H., KAINUMA R., ISHIDA K., J. Electron. Mater., 29 (10) (2000), 1137.10.1007/s11664-000-0004-9
  14. [14] KINNEY C., LINARES X., LEEK O., MORRIS J.W., J. Electron. Mater., 42 (4) (2013), 607.10.1007/s11664-012-2306-0
  15. [15] KIM K.S., HUH S.H., SUGANUMA K., J. Alloy. Compd., 352 (1 - 2) (2003), 226.10.1016/S0925-8388(02)01166-0
  16. [16] KARAKAYA I., THOMPSON W.T., Bull. Alloy Phase Diagr., 8 (4) (1987), 340.10.1007/BF02869270
  17. [17] SUBRANMANIAN P.R., PEREPEZKO J.H., J. Phase Equilib. Diff., 14 (1) (1993), 62.10.1007/BF02652162
  18. [18] LEHMAN L.P., ATHAVALE S.N., FULLEM T.Z., GIAMIS A.C., KINYANJUI R.K., LOWENSTEIN M., MATHER K., PATEL R., RAE D., WANG J., XING Y., ZAVALIJ L., BORGESEN P., COTTS E.J., J. Electron. Mater., 33 (12) (2004), 1429.10.1007/s11664-004-0083-0
  19. [19] EL-DALY A.A., EL-TANTAWY F., HAMMAD A.E., GAAFAR M.S., EL-MOSSALAMY E.H., AL-GHAMDI A.A., J. Alloy. Compd., 509 (26) (2011), 7238.10.1016/j.jallcom.2011.01.062
  20. [20] FREITAS E.S., OSORIO W.R., SPINELLI J.E., GARCIA A., Microelectron. Reliab., 54 (6 - 7) (2014), 1392.10.1016/j.microrel.2014.02.014
  21. [21] YOU T., KIM Y., JUNG W., MOON J., CHOE H., J. Alloy. Compd., 486 (1 - 2) (2009), 242.10.1016/j.jallcom.2009.07.085
  22. [22] HU X., CHEN W., WU B., Mat. Sci. Eng. A-Struct., 556 (2012), 816.10.1016/j.msea.2012.07.073
  23. [23] OHNUMA I., LIU X.J., OHTANI H., ISHIDA K., J. Electron. Mater., 28 (11) (1999), 1164.10.1007/s11664-999-0152-5
  24. [24] LUO T., CHEN Z., HU A., LI M., Mat. Sci. Eng. AStruct., 556 (2012), 885.10.1016/j.msea.2012.07.086
  25. [25] WEI C., LIU Y.C., HAN Y.J., WAN J.B., YANG K., J. Alloy. Compd., 464 (1 - 2) (2008), 301.10.1016/j.jallcom.2007.09.103
  26. [26] SONG J.M., LIN K.L., J. Mater. Res., 18 (9) (2003), 2060.10.1557/JMR.2003.0290
  27. [27] CHEN K.I., LIN K.L., J. Electron. Mater., 31 (8) (2002), 861.
  28. [28] AHMED M., FOUZDER T., SHARIF A, GAIN A.K., CHAN Y.C., Microelectron. Reliab., 50 (2010), 1134.10.1016/j.microrel.2010.03.017
  29. [29] LIN K.L., SHIH C.L., J. Electron. Mater., 32 (12) (2003), 1496.10.1007/s11664-003-0120-4
  30. [30] CHEN K.I., CHENG S.C., WU S., LIN K.L., J. Alloy. Compd., 416 (2006), 98.10.1016/j.jallcom.2005.08.034
  31. [31] SONG J.M., LAN G.F., LUI T.S., CHEN L.H., Scripta Mater., 48 (8) (2003), 1047.10.1016/S1359-6462(02)00647-4
  32. [32] SONG J.M., LUI T.S., LANG F., CHEN L.H., J. Alloy. Compd., 379 (1 - 2) (2004), 233.10.1016/j.jallcom.2004.02.031
  33. [33] LUO T., CHEN Z., HU A., LI M., LI P., Microelectron. Reliab., 53 (12) (2013), 2018.10.1016/j.microrel.2013.06.010
DOI: https://doi.org/10.1515/msp-2015-0048 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
Language: English
Page range: 317 - 330
Submitted on: Aug 14, 2014
Accepted on: Feb 11, 2015
Published on: Jul 11, 2015
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year

© 2015 S.N. Alam, Prerna Mishra, Rajnish Kumar, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.